Add like
Add dislike
Add to saved papers

Sub-micrometre focusing of intense 100 keV X-rays with multilayer reflective optics.

A high-flux sub-micrometre focusing system was constructed using multilayer focusing mirrors in Kirkpatrick-Baez geometry for 100 keV X-rays. The focusing mirror system had a wide bandwidth of 5% and a high peak reflectivity of 74%. Performance was evaluated at the undulator beamline BL05XU of SPring-8, which produced an intense 100 keV X-ray beam with a bandwidth of 1%. When the light source was focused directly in both vertical and horizontal directions, the beam size was measured to be 0.32 µm (V) × 5.3 µm (H) with a flux of 1 × 1012  photons s-1 . However, when a limited horizontal slit was used to form a secondary source, the focusing beam size decreased to 0.25 µm (V) × 0.26 µm (H) with a flux of 6 × 1010  photons s-1 . The 200 nm line and space patterns of a Siemens star chart made of tantalum were clearly resolved by the absorption contrast of the focused beam. This 100 keV focusing system is applicable to various fields of nondestructive analyses with sub-micrometre resolutions.

Full text links

We have located links that may give you full text access.
Can't access the paper?
Try logging in through your university/institutional subscription. For a smoother one-click institutional access experience, please use our mobile app.

Related Resources

For the best experience, use the Read mobile app

Mobile app image

Get seemless 1-tap access through your institution/university

For the best experience, use the Read mobile app

All material on this website is protected by copyright, Copyright © 1994-2024 by WebMD LLC.
This website also contains material copyrighted by 3rd parties.

By using this service, you agree to our terms of use and privacy policy.

Your Privacy Choices Toggle icon

You can now claim free CME credits for this literature searchClaim now

Get seemless 1-tap access through your institution/university

For the best experience, use the Read mobile app